Enhanced breakdown voltage of Si-GaN monolithic heterogeneous integrated Cascode FETs by the device structure design

نویسندگان

چکیده

In this work, the factors affecting breakdown voltage of Si-GaN monolithic heterogeneous integrated Casccode FET fabricated by transfer printing were investigated. These two are avalanche resistance Si device and thickness SiN electrical isolation layer. Two kinds structures, MOSFET laterally-diffused (LDMOSFET), designed to study effect devices on characteristics Cascode FET. The layer was analyzed. Finally, reached 770 V.

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ژورنال

عنوان ژورنال: Solid-state Electronics

سال: 2022

ISSN: ['0038-1101', '1879-2405']

DOI: https://doi.org/10.1016/j.sse.2022.108251